Abstract

The paper explains how the excitation of electrons and ions, which release light at certain wavelengths when they return to lower energy levels, produces unique spectra in plasma. This spectrum of emissions is used to provides a distinctive fingerprint to recognize the substances and components found in the plasma and determine their relative quantities. It covers current developments in these methodologies, including enhanced data gathering devices, high-resolution spectrometers, and sophisticated calibration processes that raise the sensitivity and accuracy of real-time observations. A substantial portion of the research is devoted to the various disciplines in which plasma spectroscopy finds application. Plasma spectroscopy is used in industrial operations, such semiconductor production, to monitor and regulate the process surface treatment and plasma arc welding. Improved product quality and efficiency may be achieved by precisely controlling process parameters with the use of real-time data from plasma spectroscopy. Plasma spectroscopy aids in environmental monitoring by offering useful data on pollutant concentrations and air composition, which improves comprehension and control of environmental effects. The study also looks at the use of plasma spectroscopy in basic research, such as investigations into the physics and chemistry of plasmas. Researchers may learn more about the behavior of plasmas, their interactions, and how different external influences affect their dynamics by having access to real-time characterisation of plasma characteristics. Problems with plasma spectroscopy are addressed, including the necessity for calibration, background signal interference, and the difficulty of interpreting spectra in dynamic situations.